Asher Plasma Cleaning Device
Application:
* MEMS laboratories to eliminate residues of the lithography process
* Textile laboratories for making hydrophilic fabrics (of normal fabrics) by plasma gases such as nitrogen, oxygen
Product Introduction:
In this product, the design of the plasma system is used as a dry remover, and by controlling the amount of gas entering the reactor, the power and time of the applied plasma, different surface properties are created. This property is used in many industries to surface functionalization.
Technical Specifications:
|
Ground (base) vacuum |
50 millitorr |
|
Operating vacuum |
400-700 millitorr |
|
RF power |
100 watts |
|
Input gas |
Oxygen |
|
System control |
Automatically |
| Company | |
|---|---|
| Type | This product is a final B2B equipment. |
Related Products
Application:
Manufacturing MEMS sensors, microfluidics, LAB on Chip sampling chips, microelectronics and electronic chip manufacturing, etc.
Application:
* Wet etching
* lithography of micro and nano structures
* In microelectronics
* In medical engineering
* Semiconductor laboratory
* In physics and nanotechnology
Application:
Lithography and pattern transfer on photoresist materials, creating patterns on thick layers, making microchannels, microelectronic devices, microsensors, MEMS, nanosensors, microfluidics
Application:
* Micron injections
* Micron contacting
* Micron positioning and movement
* Fine movements under the microscope
* Testing of micro actuators and microchips
* Measurement of electrical parameters of electronic components, MEMS, NEMS and microfluidics.
Application:
* Automatic etching according to time
* Fabrication of micro sensors
* Fabrication of nano and micro structures
* Fabrication of microfluidic, MEMS, Bio and microelectronic devices
* Production of dental implants according to production instructions in 7 etching steps
Application:
* Industrial Laboratories
* Research Laboratories
Application:
Transistor characterization and electrical characteristic curve drawing
Application:
* Pattern transfer from glass mask to photoresist
* Transferring the pattern from the talc mask onto the photoresist
* Molding for PDMS or biocompatible materials
* Can be used in NANO, thin film, microelectronics, MEMS, medical engineering and chemistry laboratories.
Application:
* Characterization of various types of sensors, optical devices, solar cells, etc
* Drawing the voltage current curve
Application:
* Measurement of sample mobility
* Density measurement of sample carriers
* Determining the type of material carriers
Application:
* Manufacturing micron scale equipment and tools in limited quantities
* Manufacturing MEMS and nano sensors
* Manufacturing microelectronic components and circuits
* Implementing these components and circuits on the substrate
* Manufacturing microfluidic laboratory sets