Vertical Silicone Removal Device – Deep Reactive Ion Etching (DRIE)
Application:
* In nano-related laboratories and research institutes
* Electronics and semiconductor devices
* Making acceleration sensors
* MEMS devices
* Type AFM (Atomic Force Microscopy)
Product Introduction:
The vertical silicon removal device is one of the common devices present in electronic fabs and micro/nano electronic laboratories, through which dry removal of silicon is done. The process designed for this device is such that it differentiates it from other existing devices. This device does not even use gases similar to other processes in the world, and deep and vertical removal of silicone takes place in it with an innovative structure. This product has an international patent and many articles have been published using it. It includes vacuum chamber, mechanical pumps and roots, radio frequency power source to create plasma, impedance matching network for different types of gases and different amounts, inlet gas controller (Mass Flow Controller (MFC)), digital program and fully automatic control for the user.
Technical Specifications:
Operating vacuum | 380 volts |
RF power | 300 watts |
Input gases | Oxygen, hydrogen and SF6 |
Pressure |
Advantages:
The ability to control processes in a repeatable way
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Type | This product is a final B2B equipment. |